KLAofFilmetricsThe series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range fromnm-mmIt can achieve precise thickness measurement of films such as photoresist, oxides, silicon or other semiconductor films, organic thin films, conductive transparent films, etc., and is widely used in semiconductor, microelectronics, biomedical and other fields.FilmetricshaveF10-HC、F20、F32、F40、F50、F60- tWaiting for multiple products, how many can be measuredmmGo to450mmSample size, film thickness measurement rangeFrom 1nm to mm level. F40Used for measuring light spots<1µmThe thickness of the thin film.

Measurement principle - Spectral reflectance

Spectral ellipsometer(SE)Spectral Reflectometer (SR)They all use the analysis of reflected light to determine the thickness and refractive index of dielectrics, semiconductors, and metal thin films. The main difference between the two is that ellipsometers measure light reflected from thin films at small angles, while spectrometers measure light reflected vertically from thin films. Spectral reflectometry measures vertical light and ignores polarization effects (the vast majority of thin films are rotationally symmetric). Because it does not involve any mobile devices, the spectral reflectometer has become a simple and low-cost instrument. Spectral reflectometry can be easily integrated with more powerful transmittance analysis. Spectral reflectometry is usually used when the film thickness exceeds10umThe preferred method is ellipsometry, which focuses on thinness10nmThe thickness of the film. In10nm to 10umBetween thicknesses, both techniques are available. Moreover, spectral reflectometers that are fast, simple, and cost-effective are usually a better choice.

Main applications

Measure thickness, refractive index, reflectivity, and transmittance:

• Single layer film or multi-layer film overlay
• Single membrane layer
• Liquid film or air layer

Technical Capability

Spectral wavelength range： 190-1700 nm

Thickness measurement range:1nm-250 μm

Measure the minimum thickness of n&k:50 nm

Accuracy: Take the larger value,1nm or 0.2%

Accuracy:0.02nm

Stability:0.05nm

Spot size: minimum achievable0.5µm

Sample size: diameter from1mm to 300mmOr larger

Semiconductor thin films: photoresist, process thin films, dielectric materials

lcd:OLEDGlass thickness、 ITO

Optical coating: hard coating thickness, anti reflective coating

Polymer film:PI、PC